Process
Interferometrically controlled laser lithography system DWL66 from Heidelberg Instruments with a writing wavelength of 405nm.
Section from a mask structure for the production of a microlens array. The individual miro lenses in this example have an edge length of 600 µm in a Cartesian arrangement. The mask consists of several thousand punctiform mask openings per lens. The ion exchange is controlled locally by the density and size of the openings.